{"id":969,"date":"2021-03-11T13:54:21","date_gmt":"2021-03-11T12:54:21","guid":{"rendered":"http:\/\/prokon-elektronika.pl\/katalog\/uncategorized\/evg101-zaawansowany-system-obrobki-fotorezystu\/"},"modified":"2021-03-23T15:30:26","modified_gmt":"2021-03-23T14:30:26","slug":"evg101-advanced-resist-processing-system","status":"publish","type":"product","link":"https:\/\/prokon-elektronika.pl\/en\/katalog\/devices-for-photolithography\/evg101-advanced-resist-processing-system\/","title":{"rendered":"EVG101 Advanced resist processing system"},"content":{"rendered":"<p><span style=\"font-weight: 400;\">Single-wafer resist processing in R&amp;D and small-scale production<\/span><\/p>\n<p><span style=\"font-weight: 400;\">The EVG101 resist processing system performs R&amp;D-type processes on a single chamber design, which is fully compatible with EVG?s automated systems. The EVG101 supports wafers up to 300 mm and can be configured for spin or spray coating and developing. Conformal layers of photoresist or polymers are achieved on 3D structured wafers for interconnection techniques with EVG?s advanced OmniSpray\u00a0coating technology. This ensures low material consumption of precious high-viscosity photoresists or polymers while improving uniformity and resist spreading options.<\/span><\/p>\n<p><b>Features<\/b><\/p>\n<ul>\n<li style=\"font-weight: 400;\" aria-level=\"1\"><span style=\"font-weight: 400;\">Wafer size up to 300 mm<\/span><\/li>\n<li style=\"font-weight: 400;\" aria-level=\"1\"><span style=\"font-weight: 400;\">Automated spin or spray coating or developing with manual wafer load\/unload<\/span><\/li>\n<li style=\"font-weight: 400;\" aria-level=\"1\"><span style=\"font-weight: 400;\">Quick and easy process transfer from research to production utilizing proven modular design and standardized software<\/span><\/li>\n<li style=\"font-weight: 400;\" aria-level=\"1\"><span style=\"font-weight: 400;\">Syringe dispense system for utilization of small resist volumes, including high-viscosity resists<\/span><\/li>\n<li style=\"font-weight: 400;\" aria-level=\"1\"><span style=\"font-weight: 400;\">Small footprint while maintaining a high level of personal and process safety<\/span><\/li>\n<li style=\"font-weight: 400;\" aria-level=\"1\"><span style=\"font-weight: 400;\">Multi-user concept (unlimited number of user accounts and recipes, assignable access rights, different user interface languages)<\/span><\/li>\n<li style=\"font-weight: 400;\" aria-level=\"1\"><span style=\"font-weight: 400;\">Options:<\/span>\n<ul>\n<li style=\"font-weight: 400;\" aria-level=\"2\"><span style=\"font-weight: 400;\">Uniform coating of high-topography wafer surfaces with OmniSpray? coating technology<\/span><\/li>\n<li style=\"font-weight: 400;\" aria-level=\"2\"><span style=\"font-weight: 400;\">Wax and epoxy coating for subsequent bonding processes<\/span><\/li>\n<li style=\"font-weight: 400;\" aria-level=\"2\"><span style=\"font-weight: 400;\">Spin-On-Glass (SOG) coating<\/span><\/li>\n<\/ul>\n<\/li>\n<\/ul>\n","protected":false},"excerpt":{"rendered":"<p><span style=\"font-weight: 400;\">Single-wafer resist processing in R&amp;D and small-scale production<\/span><\/p>\n","protected":false},"featured_media":796,"template":"","meta":[],"class_list":["post-969","product","type-product","status-publish","has-post-thumbnail","hentry","product_cat-devices-for-photolithography","product_tag-material-engineering","product_tag-nanotechnology","product_tag-semiconductor-electronics","pa_producent-evgroup-en"],"_links":{"self":[{"href":"https:\/\/prokon-elektronika.pl\/en\/wp-json\/wp\/v2\/product\/969","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/prokon-elektronika.pl\/en\/wp-json\/wp\/v2\/product"}],"about":[{"href":"https:\/\/prokon-elektronika.pl\/en\/wp-json\/wp\/v2\/types\/product"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/prokon-elektronika.pl\/en\/wp-json\/wp\/v2\/media\/796"}],"wp:attachment":[{"href":"https:\/\/prokon-elektronika.pl\/en\/wp-json\/wp\/v2\/media?parent=969"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}