Unlock the full nano patterning potential of your SEM or FIB-SEM

Meet the new ELPHY, an improved version of the world’s most successful pattern generator of Raith that upgrades any SEM or FIB-SEM with dedicated nanolithography capabilities. Now in its 9th generation, it comes with max. 50 MHz writing speed, 20 bit patterning resolution and sophisticated writefield distortion correction functionality.

 

Key Benefits:
•Comprehensive workflow integration
•Unique hardware concept for ultimate precision
•Flexibility and automation for complex processes
•Application-specific solutions
New features, better performance
ELPHY is now faster and more precise than ever before, delivering improved placement accuracies and pattern fidelity.

 

Find out everything about the new ELPHY
https://raith.com/new-elphy/?utm_source=launch-mail&utm_medium=email&utm_campaign=elphy-launch