Processes and operations carried out in offered devices

Thanks to the offered specialized equipment, it is possible to carry out the following processes and operations:

  • layers deposition using the spin / spray method,
  • lithography,
  • wafer bonding,
  • Nano Imprint Lithography,
  • electron lithography (EBL) and ion lithography (IBL),
  • thermal oxidation / annealing
  • diffusion,
  • high vacuum encapsulation,
  • LPCVD, CVD, PVD,
  • processing of photoimagible thick-film pastes,
  • LTCC (Low Temperature Coofired Ceramics) technology,
  • firing of thick film pastes, LTCC ceramics,
  • low-temperature processes,
  • heat treatment of metals and ceramics,
  • sintering of nuclear fuel pellets,
  • metallization of solar cells (drying and firing of contacts, producing an emitter),
  • Bumps soldering, reflow soldering,
  • screen printing,
  • making electrical wire connections (wire bonding),
  • placing and bonding of structures (diebonding, flipchip bonding),
  • precise cutting of substrates – automatic and manual,
  • mixing and deaeration in a planetary mixer of all materials, even those of very high viscosity, without mixing tools,
  • rolling materials in a three-roll mill,
  • live inspection, taking photos and videos, 2D and 3D measurements, roughness measurement, non-destructive testing on a digital video 3D microscope,
  • non-contact measurement of submicron height over long distances, on any type of surface using a confocal white light profilometer, a wide range of measurements: profile and multiprofiles, shapes and forms, flatness, waviness and coplanarity, roughness, structure, defects,