Raith Nano2016 22nd seminar on electron and ion beam fabrication for nanotechnology
From 15.02 to 17.02 was held Raith seminary in Dortmund. This seminar is targeted on those who think about investing into Electron Beam Lithography or FIB Nanofabrication equipment and therefore would like to learn how the Raith solutions help to solve state-of-the-art nanofabrication tasks. Electron Beam Lithography and Focused Ion Beam Nanofabrication are fundamental techniques for nanofabrication in research, development and production. Raith NANO 2016 was an excellent opportunity to interact with like-minded professionals and discuss the latest developments within the community.
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At the meeting were invited speakers from prestigious European universities. They presented the most interesting and the most important results of their current work carried out using Raith systems.
Presentations were given by:
- Dr. Georg Schmidt / Martin-Luther-University Halle-Wittenberg, Germany “Electron Beam Lithography with special resist”
- Dr. Dan Read / Cardiff University,UK “Electron beam lithography for condensed matter physics research at Cardiff University”
- Denis Presnov / Moscow State University, Russia “Electron Beam Lithography on the chip edge for the local probe with active nanosensor”
- Janne Laukkanen / University of Eastern Finland, Joensuu, Finland “Micro- and Nanostructures for Photonics Applications”
- Dr. Claus J. Burkhardt / NMI Naturwissenschaftliches und Medizinisches Institut, Reutlingen, Germany “FIB for rapid prototyping of nano sensors”