The new Raith E-LINE system

Meet the new E-LINE 100, well-established and unique multifunctional nanoengineering EBL Raith system now with more functionalities and better performance!

 

Key Features:
•True multifunctionality – along the entire process technology chain
•Flexibility and upgradability
•Application-focused features to improve and simplify lithography beyond specs
•Innovative FPGA-based 50 MHz / 20-bit pattern generator
•Beam size: 1.2 nm, stitching: 25 nm, overlay: 25 nm
•New autofocus, -stigmation, – brightness and -contrast functionality

 

Better specifications, improved performance
The new E-LINE not only delivers better beam size, stitching, and overlay specification, but also makes working with lithography a lot easier.

 

More information:
https://raith.com/products/multifunctional-ebl/