EVG610 Mask alignment system
Producer:
EVGroup
Application:
Nanotechnology
Semiconductor electronics
Categories:
Devices for photolithography
Nanoimprint devices
Description:
The EVG?610 is a compact and multi-purpose R&D system that can handle small substrate pieces and wafers up to 200 mm.
Stand-alone system for wafer sizes up to 100 mm / 150 mm / 200 mm
Top-side / bottom-side alignment down to ? 0.5 ?m / ? 1.0 ?m
High-resolution top- and bottom-side splitfield microscopes for double-side alignment
Soft-, hard-, vacuum contact and proximity exposure
Automated wedge compensation
Bond Alignment and NIL option
Supports the latest UV-LED technology