Description:

PIONEER ? top technology for the best of both worlds: EBL and imaging in a single system 

PIONEERTM is the ideal solution for all universities and scientists with equal requirements for both an Electron Beam Lithography system and an analytical Scanning Electron Microscope for imaging purposes. 

PIONEER, as an ideal EBL-SEM hybrid, integrates all ingredients for professional EBL and SEM into one complete turnkey system. The system stands for almost unlimited bandwidth of nanolithography, imaging and analytical applications. 

The system architecture has been designed and developed with particular consideration of given research budgets in university environments. At the same time, PIONEER delivers guaranteed EBL performance in linewidth, stitching and overlay.

Compared to a state-of-the-art SEM with pattern generator it offers better guaranteed lithography specifications. The latest electron optics technology provides the smallest beam size (<1.6 nm) in the world within a professional EBL system. This permits not only guaranteed straightforward sub-8 nm nanolithography, but also SEM imaging and analysis at ultra-high resolution to the order of 1 nm. Up to 5 different (optional) detectors, which are suitable for material and life science applications are available.

The system includes a high-precision 2´´ laser interferometer stage for both large-area lithography and image acquisition. A unique optional feature of this stage is a fully integrated module for continuous rotation (360°) and tilt (0?90°) of the sample for comfortable electron microscope imaging.