Wire bonders and die bonders- Bond testers
- Printers
- Digital optical microscopes 3D
- Confocal systems
- Laboratory mixers
- Furnaces
- Wafer bonders
- Wafer cleaners
- Devices for photolithography
- Nanoimprint devices
- Electron beam lithography systems
- Ion beam lithography systems
- Devices for maskless lithography
- Devices for production the most accurate large-area, high-resolution image mosaics
- Devices for LTCC technology
- Devices for thick film photoimagible pastes
- Encapsulation devices
- Dicing saws
- Materials
Raith150 Two
Producer:
Raith GmbH
Application:
Nanotechnology
Semiconductor electronics
Category:
Electron beam lithography systems
Description:
RAITH150 Two ? Raith´s environmentally tolerant, ultra-high resolution direct write system
Since its introduction, the RAITH150 Two has established itself as a bestseller among universal, high resolution Electron Beam Lithography systems. It is used in research centers and nanotechnology centers worldwide.
RAITH150 Two exposes structures smaller than 5 nm. Process operation and documentation is enabled by outstanding scanning electron microscope (SEM) properties. RAITH150 Two works with sample sizes from a few mm to 8-inch silicon wafers.
The system stability, even in difficult environments, required for demanding exposures is made possible by a thermally stabilized and environmentally tolerant housing.