Electron beam lithography systems
eLINE Plus ? the swiss army knife for nanofabrication
eLINE Plus is the optimum, widely distributed system for universities and research centers that want to combine an efficient and uncompromising Electron Beam Lithography system with an open platform for further nanofabrication processes and techniques.
In order to be prepared for the broadest bandwidth of applications, modern nanotechnology research today requires multiple techniques beyond classic and pure Electron Beam Lithography (EBL) ? preferentially in-situ.
In addition to fully integrated nanomanipulators and a mechanism for electron beam induced deposition and etching, a range of further options is available that identifies eLINE Plus as currently the most versatile and unique nanoengineering EBL system.